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How do we create a centered linear pattern of four?
martin_kopplow
Member Posts: 871 PRO
Seems easy, but appears not to be supported: How do we create a centered linear pattern of four?
It works with odd numbers, of course, but not with even numbers. I would expect the tool to offset the seed instance by 1/2 of the distance and create a centered pattern (relative to the original position) anyway.
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That is a bit inconsistent behavior that could be cleaned up. It would apply to any even number. Plus checking the centered option essentially doubles your instance count for number of pieces vs not centered.
I'd be fully okay with the instance number just being the overall count of instances in both scenarios, for halving the number of an uneven centered instance count, when the user unchecks the 'centered' opton, would obviously not work. The 'centered' option should just work with the same workflow with odd end even numbers. That might become an important issue downstrems, when the number gets edited at a later point in time, and it would break the history with it's current behaviour.
Therefore, it would be important to "clean that up", and if it only was for sake of GUI consistency.
ive also been wanting this kind of thing, maybe next FS
Hi @joshtargo , well this could be a thing for an FS, but I think it is so basic it should be in the pattern tool itself. It just makes no sense to break the histoy just because we change image count from an odd to an even number.
It's also slightly inconsistent with symmetrical extrudes which use the total dimension for the overall and doesn't add it to both sides of the sketch.
Wouldn't it be weird if you apply a pattern and the position of the original shifts? That's what would need to be required for something like this wouldn't it? Or would there be a dropdown so you can indicate on what side more will be added than on the other?
I think a pattern is about a seed instance, distance, number, and a starting point. Until now, it was only by coincidence (and lack of other approaches), that the starting point was considered to be in the center of the seed instance.
I've seen solutions where you could create a pattern and only then pick a deliberate seed (no matter where it is) and a seed point. That opens up the possibility to pattern in different locations without the requirement to copy the seed to that location first. Also, the seed could be swapped out later. MCs would come very handy here …