Welcome to the Onshape forum! Ask questions and join in the discussions about everything Onshape.

First time visiting? Here are some places to start:
  1. Looking for a certain topic? Check out the categories filter or use Search (upper right).
  2. Need support? Ask a question to our Community Support category.
  3. Please submit support tickets for bugs but you can request improvements in the Product Feedback category.
  4. Be respectful, on topic and if you see a problem, Flag it.

If you would like to contact our Community Manager personally, feel free to send a private message or an email.

How can I reduce regen time for THESE SPECIFIC detail patterns? (Perfboard)

skelobonesskelobones Member Posts: 26 EDU
edited March 21 in Using Onshape
Screenshot 2026-03-22 091853.png

I wish to design this perfboard to be accurate for the purpose of looking nice. In history, I find that modelling simple things can make it harder to constrain dimensions, because I don't grasp relative space particularly well. If this was a simple board of 4 holes correctly dimensioned in the corners, then sketch points indicating the contacts & holes, it would be more difficult for me to wrap my head around with when I want to model additional components then assemble. I don't have render studio, being an EDU account, but I still want to make some nice screenshots with this project, as well as apply my visual detailing to further smaller projects therefore I can present them more tangibly.

The regeneration time is approx. 4 seconds, due to the sheer amount of faces. Is there a better process I could apply on my workflow to create visually accurate/appealing parts, while saving time? Potentially a checklist of "Can I suppress this until later?" such as keeping the face splits, or solely the Sketch, unsuppressed?

Answers

  • nick_papageorge_dayjobnick_papageorge_dayjob Member, csevp Posts: 1,100 PRO

    Sketch one hole, then pattern the hole. Rather than have the pattern within the sketch like it is now.

Sign In or Register to comment.